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Hard X-Ray Focusing with Curved Reflective Multilayers

dc.contributor.authorMorawe, Christian
dc.contributor.authorOsterhoff, Markus
dc.date.accessioned2011-03-02T08:43:55Z
dc.date.available2011-03-02T08:43:55Z
dc.date.issued2010
dc.identifier.urihttp://resolver.sub.uni-goettingen.de/purl?gs-1/5905
dc.description.abstractThis paper provides a comprehensive overview on the utilization of curved graded multilayer coatings as focusing elements for hard X-rays. It concentrates on the Kirkpatrick-Baez (KB) focusing setup that has been developed at 3rd generation synchrotron sources worldwide. The optical performance of these devices is evaluated applying analytical and numerical approaches. The essential role of the multilayer coating and its meridional d-spacing gradient are discussed as well as important technological issues. Experimental data and examples of operational KB focusing devices and applications complement the work.
dc.language.isoeng
dc.relationinfo:eu-repo/grantAgreement/EC/FP7/226716/EU//ELISA
dc.rightsopenAccess
dc.rights.urihttp://goedoc.uni-goettingen.de/goescholar/License_Goedoc_2009_03.txt
dc.subjectHard X-Ray Focusing
dc.subject.ddc530
dc.titleHard X-Ray Focusing with Curved Reflective Multilayers
dc.typejournalArticle
dc.identifier.doi10.1155/2010/479631
dc.type.versionsubmittedVersion
dc.bibliographicCitation.volume2010
dc.bibliographicCitation.firstPage8
dc.type.subtypejournalArticle
dc.bibliographicCitation.articlenumber479631
dc.relation.euprojectELISA
dc.description.statuspeerReviewed
dc.bibliographicCitation.journalX-Ray Optics and Instrumentation


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